Eco-friendly modular filter for efficient AMC control and reduced carbon impact in semiconductor plantsIn the process of going smart, many semiconductor factories are beginning to discover that there are micro-contaminants in the environment that are invisible to the naked eye, which are suspended in the air and cause great harm to products, but traditional filtration methods such as HEPA or ULPA are difficult to remove effectively. It is therefore imperative that intelligent control mechanisms are put in place within the plant to address the AMC (Airborne Molecular Contamination) problem.
According to Pratt & Whitney technical expert, with the development of advanced semiconductor processes, dust suspended in the air can be effectively controlled through traditional filtration methods. However, other micro-contaminants, organic or inorganic, have a much greater impact on process yields than dust. In other words, high performance AMC micro-pollution control technology is one of the key elements in the development of 5nm advanced processes by major semiconductor manufacturers.

AMC is mainly divided into MA acidic substances, MB salty substances, MC condensation substances and MD doping substances, and H₂O₂、O₃ and other unclassifiable substances. These gaseous molecular contaminants, in terms of size, only need 5~25 molecular deposits to fill up the 5nm line width and cause damage to the wafer, which is the biggest problem faced by the semiconductor industry at